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Title: Sub-10 nm patterning with DNA nanostructures: a short perspective

Journal Article · · Nanotechnology
ORCiD logo [1];  [1]; ORCiD logo [2];  [3];  [4]
  1. Univ. of California, Berkeley, CA (United States). Dept. of Chemistry
  2. Stevens Inst. of Technology, Hoboken, NJ (United States). Dept. of Mechanical Engineering
  3. IBM T.J. Watson Research Center, Yorktown Heights, NY (United States). Dept. of Science and Solutions
  4. Brookhaven National Lab. (BNL), Upton, NY (United States). Center for Functional Nanomaterials

DNA is the hereditary material that contains our unique genetic code. Since the first demonstration of two-dimensional (2D) nanopatterns by using designed DNA origami ~10 years ago, DNA has evolved into a novel technique for 2D and 3D nanopatterning. It is now being used as a template for the creation of sub-10 nm structures via either 'top-down' or 'bottom-up' approaches for various applications spanning from nanoelectronics, plasmonic sensing, and nanophotonics. This paper starts with an histroric overview and discusses the current state-of-the-art in DNA nanolithography. Finally, emphasis is put on the challenges and prospects of DNA nanolithography as the next generation nanomanufacturing technique.

Research Organization:
University of California, Berkeley, CA (United States); Brookhaven National Laboratory (BNL), Upton, NY (United States)
Sponsoring Organization:
USDOE Office of Science (SC), Basic Energy Sciences (BES)
Grant/Contract Number:
SC0012704
OSTI ID:
1407469
Report Number(s):
BNL-114447-2017-JA; KC0403020
Journal Information:
Nanotechnology, Vol. 28, Issue 44; ISSN 0957-4484
Publisher:
IOP PublishingCopyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 12 works
Citation information provided by
Web of Science

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Cited By (1)