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Title: Fixatives Used for Decommissioning and Maintenance of Radiological Facilities – 17537

Conference ·
OSTI ID:1372264

The Idaho National Laboratory (INL) and the United Kingdom (UK) National Nuclear Laboratory (NNL) have been collaborating for several years on materials and methods for the fogged/misted introduction of fixatives into radiologically contaminated facilities. The objective of the project is to deliver a process for reducing airborne radiological and/or mercury contamination and affixing loose contamination in place, thereby reducing contamination risk to employees and decreasing D&D cost and schedule. The developed process provides a reliable, unmanned method of introducing a coating that captures and fixes contamination in place within facilities. The INL coating, termed FX2, has undergone extensive non-radiological testing, including determination that it is non-flammable, affixes contamination and flows well through unusual geometries (testing at Florida International University). A series of non-active fogging trials for activity knock/tie-down application have been completed at NNL Workington on behalf of Idaho National Laboratory (INL). These trials performed by the NNL employed commercially available agricultural fogging equipment and the INL’s knock/tie-down latex formulation (FX-2). This testing successfully demonstrated the ability of the fogging devices to successfully spray the FX-2 formulation within various scenarios, and prepared the project for a radioactive trial. The INL has also developed a mercury vapor reducing form of the coating termed FX-Hg, which has shown great promise in laboratory studies.

Research Organization:
Idaho National Lab. (INL), Idaho Falls, ID (United States)
Sponsoring Organization:
USDOE Office of Environmental Management (EM)
DOE Contract Number:
DE-AC07-05ID14517
OSTI ID:
1372264
Report Number(s):
INL/CON-17-40941
Resource Relation:
Conference: Waste Management 2017, Phoenix, Arizona, USA, March 6–10, 2017
Country of Publication:
United States
Language:
English