Controlled optical properties via chemical composition tuning in molybdenum-incorporated β-Ga2O3 nanocrystalline films

Battu, Anil K.; Manandhar, S.; Shutthanandan, V.; Ramana, C. V.

doi:10.1016/J.CPLETT.2017.06.063

Title: Controlled optical properties via chemical composition tuning in molybdenum-incorporated β-Ga₂O₃ nanocrystalline films

Journal Article · Sat Jul 01 00:00:00 EDT 2017 · Chemical Physics Letters

DOI:https://doi.org/10.1016/J.CPLETT.2017.06.063· OSTI ID:1368411

Battu, Anil K. ^[1]; Manandhar, S. ^[2]; Shutthanandan, V. ^[3]; Ramana, C. V. ^[1]

Univ. of Texas, El Paso, TX (United States). Dept. of Mechanical Engineering
Univ. of Texas, El Paso, TX (United States). Dept. of Mechanical Engineering; Pacific Northwest National Lab. (PNNL), Richland, WA (United States). Environmental Molecular Sciences Lab. (EMSL)
Pacific Northwest National Lab. (PNNL), Richland, WA (United States). Environmental Molecular Sciences Lab. (EMSL)

Here, an approach is presented to design refractory-metal incorporated Ga₂O₃-based materials with controlled structural and optical properties. The molybdenum (Mo)-content in Ga₂O₃ was varied from 0 to 11 at% in the sputter-deposited Ga-Mo-O films. Molybdenum was found to significantly affect the structure and optical properties. While low Mo-content (≤4 at%) results in the formation of single-phase (β-Ga₂O₃), higher Mo-content results in amorphization. Chemically-induced band gap variability (E_g ~ 1 eV) coupled with structure-modification indicates the electronic-structure changes in Ga-Mo-O. The linear relationship between chemical-composition and optical properties suggests that tailoring the optical-quality and performance of Ga-Mo-O films is possible by tuning the Mo-content.

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Research Organization:: Pacific Northwest National Lab. (PNNL), Richland, WA (United States)

Sponsoring Organization:: National Science Foundation (NSF); USDOE Office of Science (SC), Biological and Environmental Research (BER)

Grant/Contract Number:: AC0576RL01830; ECCS-1509653

OSTI ID:: 1368411

Alternate ID(s):: OSTI ID: 1576817

Journal Information:: Chemical Physics Letters, Vol. 684, Issue C; ISSN 0009-2614

Publisher:: ElsevierCopyright Statement

Country of Publication:: United States

Language:: English

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Cited by: 14 works

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