Electrically coupling complex oxides to semiconductors: A route to novel material functionalities
- Univ. of Texas, Arlington, TX (United States). Dept. of Physics
- Yale Univ., New Haven, CT (United States). Dept. of Applied Physics. Center for Research on Interface Structures and Phenomena
- Pacific Northwest National Lab. (PNNL), Richland, WA (United States). Physical Sciences Division
- Pacific Northwest National Lab. (PNNL), Richland, WA (United States). Enviromental Molecular Sciences Lab.
- Brookhaven National Lab. (BNL), Upton, NY (United States). Center for Functional Nanomaterials
Complex oxides and semiconductors exhibit distinct yet complementary properties owing to their respective ionic and covalent natures. By electrically coupling complex oxides to traditional semiconductors within epitaxial heterostructures, enhanced or novel functionalities beyond those of the constituent materials can potentially be realized. Essential to electrically coupling complex oxides to semiconductors is control of the physical structure of the epitaxially grown oxide, as well as the electronic structure of the interface. In this paper, we discuss how composition of the perovskite A- and B-site cations can be manipulated to control the physical and electronic structure of semiconductor—complex oxide heterostructures. Two prototypical heterostructures, Ba1-xSrxTiO3/Ge and SrZrxTi1-xO3/Ge, will be discussed. In the case of Ba1-xSrxTiO3/Ge, we discuss how strain can be engineered through A-site composition to enable the re-orientable ferroelectric polarization of the former to be coupled to carriers in the semiconductor. In the case of SrZrxTi1-xO3/Ge we discuss how B-site composition can be exploited to control the band offset at the interface. Finally, analogous to heterojunctions between compound semiconducting materials, control of band offsets, i.e., band-gap engineering, provides a pathway to electrically couple complex oxides to semiconductors to realize a host of functionalities.
- Research Organization:
- Brookhaven National Laboratory (BNL), Upton, NY (United States); Univ. of Texas, Arlington, TX (United States); Yale Univ., New Haven, CT (United States); Pacific Northwest National Laboratory (PNNL), Richland, WA (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC), Basic Energy Sciences (BES); USDOE Office of Science (SC), Biological and Environmental Research (BER); National Science Foundation (NSF)
- Grant/Contract Number:
- AC02-98CH10886; DMR-1508530; DMR-1309868
- OSTI ID:
- 1358030
- Report Number(s):
- BNL-113868-2017-JA; R&D Project: 16060; 16060; KC0403020
- Journal Information:
- Journal of Materials Research, Vol. 32, Issue 2; ISSN 0884-2914
- Publisher:
- Materials Research SocietyCopyright Statement
- Country of Publication:
- United States
- Language:
- English
Web of Science
Interfacial Structure of SrZr$_{x}$Ti$_{1-x}$O$_3$ films on Ge | text | January 2018 |
Crystalline SrZrO 3 deposition on Ge (001) by atomic layer deposition for high- k dielectric applications
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journal | July 2018 |
Polarization-controlled modulation doping of a ferroelectric from first principles
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journal | March 2018 |
Epitaxial Oxides on Semiconductors: From Fundamentals to New Devices
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journal | July 2019 |
Interfacial structure of SrZr x Ti 1− x O 3 films on Ge
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journal | November 2018 |
Polarization-controlled modulation doping of a ferroelectric from first principles | text | January 2017 |
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