Structure and enhanced thermochromic performance of low-temperature fabricated VO2/V2O3 thin film
- Chinese Academy of Sciences (CAS), Shanghai (China). State Key Lab. of High Performance Ceramics and Superfine Microstructure. Shanghai Inst. of Ceramics
- Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Materials Science and Technology Division. Thin Films and Nanostructures Group
For VO2-based smart window manufacture, it is a long-standing demand for high-quality thin films deposited at low temperature. In this paper, the thermochromic films of VO2 were deposited by a magnetron sputtering method at a fairly low temperature of 250 °C without subsequent annealing by embedding a V2O3 interlayer. V2O3 acts as a seed layer to lower the depositing temperature and buffer layer to epitaxial grow VO2 film. The VO2/V2O3 films display high solar modulating ability and narrow hysteresis loop. Finally, our data can serve as a promising point for industrial production with high degree of crystallinity at a low temperature.
- Research Organization:
- Chinese Academy of Sciences (CAS), Shanghai (China)
- Sponsoring Organization:
- USDOE; Science and Technology Commission of Shanghai Municipality (STCSM) (China)
- Contributing Organization:
- Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States); National Inst. of Advanced Industrial Science and Technology, Nagoya (Japan)
- Grant/Contract Number:
- 14DZ2261203; 5157021410
- OSTI ID:
- 1356968
- Journal Information:
- Applied Physics Letters, Vol. 109, Issue 14; ISSN 0003-6951
- Publisher:
- American Institute of Physics (AIP)Copyright Statement
- Country of Publication:
- United States
- Language:
- English
Cited by: 40 works
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