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Title: Metallic dielectric photonic crystals and methods of fabrication

Patent ·
OSTI ID:1336927

A metallic-dielectric photonic crystal is formed with a periodic structure defining a plurality of resonant cavities to selectively absorb incident radiation. A metal layer is deposited on the inner surfaces of the resonant cavities and a dielectric material fills inside the resonant cavities. This photonic crystal can be used to selectively absorb broadband solar radiation and then reemit absorbed radiation in a wavelength band that matches the absorption band of a photovoltaic cell. The photonic crystal can be fabricated by patterning a sacrificial layer with a plurality of holes, into which is deposited a supporting material. Removing the rest of the sacrificial layer creates a supporting structure, on which a layer of metal is deposited to define resonant cavities. A dielectric material then fills the cavities to form the photonic crystal.

Research Organization:
Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
SC0001299; FG02-09ER46577
Assignee:
Massachusetts Institute of Technology (Cambridge, MA)
Patent Number(s):
9,523,152
Application Number:
14/478,381
OSTI ID:
1336927
Resource Relation:
Patent File Date: 2014 Sep 05
Country of Publication:
United States
Language:
English

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  • Rinnerbauer, Veronika; Ndao, Sidy; Xiang Yeng, Yi
  • Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, Vol. 31, Issue 1, Article No. 011802 https://doi.org/10.1116/1.4771901
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