Diffraction properties of multilayer Laue lenses with an aperture of 102 µm and WSi2/Al bilayers
Abstract
Here, we report on the characterization of a multilayer Laue lens (MLL) with large acceptance, made of a novel WSi2/Al bilayer system. Fabrication of multilayers with large deposition thickness is required to obtain MLL structures with sufficient apertures capable of accepting the full lateral coherence length of x-rays at typical nanofocusing beamlines. To date, the total deposition thickness has been limited by stress-buildup in the multilayer. We were able to grow WSi2/Al with low grown-in stress, and asses the degree of stress reduction. X-ray diffraction experiments were conducted at beamline 1-BM at the Advanced Photon Source. We used monochromatic x-rays with a photon energy of 12 keV and a bandwidth of ΔE/E=5.4 ∙ 10-4. The MLL was grown with parallel layer interfaces, and was designed to have a large focal length of 9.6 mm. The mounted lens was 2.7 mm in width. We found and quantified kinks and bending of sections of the MLL. Sections with bending were found to partly have a systematic progression in the interface angles. We also observed kinking in some, but not all, areas. The measurements are compared with dynamic diffraction calculations made with Coupled Wave Theory. Finally our data are plotted showing the diffractionmore »
- Authors:
-
- Argonne National Lab. (ANL), Argonne, IL (United States). X-ray Science Division; Fraunhofer Institute for Material and Beam Technology, Dresden (Germany)
- Argonne National Lab. (ANL), Argonne, IL (United States). X-ray Science Division; European XFEL GmbH, Hamburg (Germany)
- Argonne National Lab. (ANL), Argonne, IL (United States). X-ray Science Division; Brookhaven National Lab. (BNL), Upton, NY (United States)
- Brookhaven National Lab. (BNL), Upton, NY (United States)
- Argonne National Lab. (ANL), Argonne, IL (United States). X-ray Science Division
- Publication Date:
- Research Org.:
- Brookhaven National Lab. (BNL), Upton, NY (United States)
- Sponsoring Org.:
- USDOE Office of Science (SC), Basic Energy Sciences (BES)
- OSTI Identifier:
- 1335399
- Report Number(s):
- BNL-111840-2016-JA
Journal ID: ISSN 1094-4087; OPEXFF
- Grant/Contract Number:
- SC00112704
- Resource Type:
- Journal Article: Accepted Manuscript
- Journal Name:
- Optics Express
- Additional Journal Information:
- Journal Volume: 23; Journal Issue: 21; Journal ID: ISSN 1094-4087
- Publisher:
- Optical Society of America (OSA)
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE
Citation Formats
Kubec, Adam, Kujala, Naresh, Conley, Raymond, Bouet, Nathalie, Zhou, Juan, Mooney, Tim M., Shu, Deming, Kirchman, Jeffrey, Goetze, Kurt, Maser, Jörg, and Macrander, Albert. Diffraction properties of multilayer Laue lenses with an aperture of 102 µm and WSi2/Al bilayers. United States: N. p., 2015.
Web. doi:10.1364/OE.23.027990.
Kubec, Adam, Kujala, Naresh, Conley, Raymond, Bouet, Nathalie, Zhou, Juan, Mooney, Tim M., Shu, Deming, Kirchman, Jeffrey, Goetze, Kurt, Maser, Jörg, & Macrander, Albert. Diffraction properties of multilayer Laue lenses with an aperture of 102 µm and WSi2/Al bilayers. United States. https://doi.org/10.1364/OE.23.027990
Kubec, Adam, Kujala, Naresh, Conley, Raymond, Bouet, Nathalie, Zhou, Juan, Mooney, Tim M., Shu, Deming, Kirchman, Jeffrey, Goetze, Kurt, Maser, Jörg, and Macrander, Albert. 2015.
"Diffraction properties of multilayer Laue lenses with an aperture of 102 µm and WSi2/Al bilayers". United States. https://doi.org/10.1364/OE.23.027990. https://www.osti.gov/servlets/purl/1335399.
@article{osti_1335399,
title = {Diffraction properties of multilayer Laue lenses with an aperture of 102 µm and WSi2/Al bilayers},
author = {Kubec, Adam and Kujala, Naresh and Conley, Raymond and Bouet, Nathalie and Zhou, Juan and Mooney, Tim M. and Shu, Deming and Kirchman, Jeffrey and Goetze, Kurt and Maser, Jörg and Macrander, Albert},
abstractNote = {Here, we report on the characterization of a multilayer Laue lens (MLL) with large acceptance, made of a novel WSi2/Al bilayer system. Fabrication of multilayers with large deposition thickness is required to obtain MLL structures with sufficient apertures capable of accepting the full lateral coherence length of x-rays at typical nanofocusing beamlines. To date, the total deposition thickness has been limited by stress-buildup in the multilayer. We were able to grow WSi2/Al with low grown-in stress, and asses the degree of stress reduction. X-ray diffraction experiments were conducted at beamline 1-BM at the Advanced Photon Source. We used monochromatic x-rays with a photon energy of 12 keV and a bandwidth of ΔE/E=5.4 ∙ 10-4. The MLL was grown with parallel layer interfaces, and was designed to have a large focal length of 9.6 mm. The mounted lens was 2.7 mm in width. We found and quantified kinks and bending of sections of the MLL. Sections with bending were found to partly have a systematic progression in the interface angles. We also observed kinking in some, but not all, areas. The measurements are compared with dynamic diffraction calculations made with Coupled Wave Theory. Finally our data are plotted showing the diffraction efficiency as a function of the external tilting angle of the entire mounted lens. This way of plotting the data was found to provide an overview into the diffraction properties of the whole lens, and enabled the following layer tilt analyses.},
doi = {10.1364/OE.23.027990},
url = {https://www.osti.gov/biblio/1335399},
journal = {Optics Express},
issn = {1094-4087},
number = 21,
volume = 23,
place = {United States},
year = {Thu Jan 01 00:00:00 EST 2015},
month = {Thu Jan 01 00:00:00 EST 2015}
}
Web of Science
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