Observations of Ag diffusion in ion implanted SiC
- Univ. of Wisconsin, Madison, WI (United States)
- Virginia Tech, Blacksburg, VA (United States)
The nature and magnitude of Ag diffusion in SiC has been a topic of interest in connection with the performance of tristructural isotropic (TRISO) coated particle fuel for high temperature gas-cooled nuclear reactors. Ion implantation diffusion couples have been revisited to continue developing a more complete understanding of Ag fission product diffusion in SiC. Ion implantation diffusion couples fabricated from single crystal 4H-SiC and polycrystalline 3C-SiC substrates and exposed to 1500–1625°C, were investigated in this study by transmission electron microscopy and secondary ion mass spectrometry (SIMS). The high dynamic range of SIMS allowed for multiple diffusion régimes to be investigated, including enhanced diffusion by implantation-induced defects and grain boundary (GB) diffusion in undamaged SiC. Lastly, estimated diffusion coefficients suggest GB diffusion in bulk SiC does not properly describe the release observed from TRISO fuel.
- Research Organization:
- Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
- Sponsoring Organization:
- USDOE Office of Nuclear Energy (NE)
- Grant/Contract Number:
- AC05-00OR22725; AC07-05ID14517; 11-2988; AC07-051D14517
- OSTI ID:
- 1302911
- Alternate ID(s):
- OSTI ID: 1246640
- Journal Information:
- Journal of Nuclear Materials, Vol. 461; ISSN 0022-3115
- Publisher:
- ElsevierCopyright Statement
- Country of Publication:
- United States
- Language:
- English
Web of Science
Similar Records
Effect of exposure environment on surface decomposition of SiC-silver ion implantation diffusion couples
Ag out-surface diffusion in crystalline SiC with an effective SiO2 diffusion barrier