Submicron diameter single crystal sapphire optical fiber
- Virginia Polytechnic Inst. and State Univ. (Virginia Tech), Blacksburg, VA (United States)
In this work, a submicron-diameter single crystal sapphire optical fiber was demonstrated via wet acid etching at elevated temperatures. Etch rates on the order 2.3 µm/hr were achievable with a 3:1 molar ratio sulfuric-phosphoric acid solution maintained at a temperature of 343°C. A sapphire fiber with an approximate diameter of 800 nm was successfully fabricated from a commercially available fiber with an original diameter of 50 µm. The simple and controllable etching technique provides a feasible approach to the fabrication of unique waveguide structures via traditional silica masking techniques. The ability to tailor the geometry of sapphire optical fibers is the first step in achieving optical and sensing performance on par with its fused silica counterpart.
- Research Organization:
- Virginia Polytechnic Inst. and State Univ. (Virginia Tech), Blacksburg, VA (United States)
- Sponsoring Organization:
- USDOE Office of Fossil Energy (FE)
- Grant/Contract Number:
- FE0012274
- OSTI ID:
- 1258640
- Alternate ID(s):
- OSTI ID: 1246566
- Journal Information:
- Materials Letters, Vol. 138, Issue C; ISSN 0167-577X
- Publisher:
- ElsevierCopyright Statement
- Country of Publication:
- United States
- Language:
- English
Web of Science
Application of Sapphire-Fiber-Bragg-Grating-Based Multi-Point Temperature Sensor in Boilers at a Commercial Power Plant
|
journal | July 2019 |
Similar Records
Sapphire advanced mitigation process: wet etch to expose sub-surface damage and increase laser damage resistance and mechanical strength
Modal reduction in single crystal sapphire optical fiber