Effects of annealing temperature on morphology and thickness of samarium electrodeposited thin films
- Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
- Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States); Texas A & M Univ., College Station, TX (United States)
- Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States); Univ. of Tennessee, Knoxville, TN (United States)
Electroplated depositions of Sm were prepared using a vertical well-type electrodeposition unit with an aqueous ammonium acetate electrolyte system, with an average deposition yield just over 87%. The depositions were analyzed for morphology and thickness by scanning electron microscopy (SEM) and chemical composition by energy dispersion X-ray spectroscopy (EDS) and X-ray photoelectron spectroscopy (XPS) before and after firing. The depositions were fired at 125–700 °C, while varying the heating rate from 0.5 to 10 °C/min in either an oxidizing or reducing atmosphere. A heating rate of 10 °C/min was slow enough to prevent disruption of the deposition morphology during firing. Furthermore, a gas sweep enhanced the removal of any organic substituents, with an oxidizing environment being more advantageous than a reducing environment.
- Research Organization:
- Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
- Sponsoring Organization:
- USDOE Office of Nuclear Energy (NE); USDOE Office of Science (SC), Nuclear Physics (NP)
- Grant/Contract Number:
- AC05-00OR22725; AC0500OR22725
- OSTI ID:
- 1255664
- Alternate ID(s):
- OSTI ID: 1425701
- Journal Information:
- Nuclear Instruments and Methods in Physics Research. Section A, Accelerators, Spectrometers, Detectors and Associated Equipment, Vol. 830, Issue C; ISSN 0168-9002
- Publisher:
- ElsevierCopyright Statement
- Country of Publication:
- United States
- Language:
- English
Web of Science
Similar Records
Samarium electrodeposited acetate and oxide thin films on stainless steel substrate characterized by XPS
Impact of annealing on the chemical structure and morphology of the thin-film CdTe/ZnO interface