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Title: Microscopic Removal Function and the Relationship Between Slurry Particle Size Distribution and Workpiece Roughness During Pad Polishing

Journal Article · · Journal of the American Ceramic Society
DOI:https://doi.org/10.1111/jace.12631· OSTI ID:1229811

Research Organization:
Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC52-07NA27344
OSTI ID:
1229811
Report Number(s):
LLNL-JRNL-645376
Journal Information:
Journal of the American Ceramic Society, Vol. 97, Issue 1; ISSN 0002-7820
Publisher:
American Ceramic Society
Country of Publication:
United States
Language:
English

References (24)

The structure of abraded glass surfaces journal February 1922
Effect of rogue particles on the sub-surface damage of fused silica during grinding/polishing journal April 2008
Chemical processes in glass polishing journal April 1990
Material removal mechanism in chemical mechanical polishing: theory and modeling journal May 2001
Nanoscale ductile grinding of glass by diamond fibres journal October 1996
Hydrodynamic analysis of chemical mechanical polishing process journal October 2000
Modeling the Effects of Abrasive Size Distribution, Adhesion, and Surface Plastic Deformation on Chemical-Mechanical Polishing journal January 2005
Tribology Analysis of Chemical‐Mechanical Polishing journal June 1994
Analysis of Large Particle Count in Fumed Silica Slurries and Its Correlation with Scratch Defects Generated by CMP journal January 2006
Effects of Ceria Abrasive Particle Size Distribution below Wafer Surface on In-Wafer Uniformity during Chemical Mechanical Polishing Processing journal January 2011
Semi-ductile grinding and polishing of Pyrex glass journal November 1998
Effects of abrasive size distribution in chemical mechanical planarization: Modeling and verification journal August 2003
Nanoindentation hardness of particles used in magnetorheological finishing (MRF) journal January 2000
Effect of Cerium Oxide Particle Sizes in Oxide Chemical Mechanical Planarization journal January 2009
Fracture of Brittle Solids book January 2010
Hydrodynamics of Slurry Flow in Chemical Mechanical Polishing journal January 2006
Effect of Particle Size of Chemical Mechanical Polishing Slurries for Enhanced Polishing with Minimal Defects journal January 2000
Slurry particle size evolution during the polishing of optical glass journal January 1995
Contact Mechanics book January 1985
Optimized pitch button blocking for polishing high-aspect-ratio optics journal January 2012
Controlling Scratching in Cu Chemical Mechanical Planarization journal January 2009
Convergent Pad Polishing of Amorphous Silica journal February 2012
Sub-surface mechanical damage distributions during grinding of fused silica journal December 2006
Pad Surface Roughness and Slurry Particle Size Distribution Effects on Material Removal Rate in Chemical Mechanical Planarization journal January 2005