Pulsed Laser-Assisted Focused Electron-Beam-Induced Etching of Titanium with XeF 2 : Enhanced Reaction Rate and Precursor Transport

Noh, J. H.; Fowlkes, J. D.; Timilsina, R.; Stanford, M. G.; Lewis, B. B.; Rack, P. D.

doi:10.1021/am508443s

Title: Pulsed Laser-Assisted Focused Electron-Beam-Induced Etching of Titanium with XeF ₂ : Enhanced Reaction Rate and Precursor Transport

Journal Article · Wed Jan 28 00:00:00 EST 2015 · ACS Applied Materials and Interfaces

DOI:https://doi.org/10.1021/am508443s· OSTI ID:1185846

Noh, J. H. ^[1]; Fowlkes, J. D. ^[2]; Timilsina, R. ^[1]; Stanford, M. G. ^[1]; Lewis, B. B. ^[1]; Rack, P. D. ^[2]

Univ. of Tennessee, Knoxville, TN (United States)
Univ. of Tennessee, Knoxville, TN (United States); Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)

We introduce a laser-assisted focused electron-beam-induced etching (LA-FEBIE) process which is a versatile, direct write nanofabrication method that allows nanoscale patterning and editing; we do this in order to enhance the etch rate of electron-beam-induced etching. The results demonstrate that the titanium electron stimulated etch rate via the XeF2 precursor can be enhanced up to a factor of 6 times with an intermittent pulsed laser assist. Moreover, the evolution of the etching process is correlated to in situ stage current measurements and scanning electron micrographs as a function of time. Finally, the increased etch rate is attributed to photothermally enhanced Ti–F reaction and TiF4 desorption and in some regimes enhanced XeF2 surface diffusion to the reaction zone.

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Research Organization:: Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS)

Sponsoring Organization:: USDOE Office of Science (SC)

Grant/Contract Number:: AC05-00OR22725

OSTI ID:: 1185846

Journal Information:: ACS Applied Materials and Interfaces, Vol. 7, Issue 7; ISSN 1944-8244

Publisher:: American Chemical Society (ACS)Copyright Statement

Country of Publication:: United States

Language:: English

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Cited by: 9 works

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Title: Pulsed Laser-Assisted Focused Electron-Beam-Induced Etching of Titanium with XeF 2 : Enhanced Reaction Rate and Precursor Transport

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Title: Pulsed Laser-Assisted Focused Electron-Beam-Induced Etching of Titanium with XeF ₂ : Enhanced Reaction Rate and Precursor Transport