Apparatus and process for deposition of hard carbon films
A process and an apparatus for depositing thin, amorphous carbon films having extreme hardness on a substrate is described. An enclosed chamber maintained at less than atmospheric pressure houses the substrate and plasma producing elements. A first electrode is comprised of a cavity enclosed within an RF coil which excites the plasma. A substrate located on a second electrode is excited by radio frequency power applied to the substrate. A magnetic field confines the plasma produced by the first electrode to the area away from the walls of the chamber and focuses the plasma onto the substrate thereby yielding film deposits having higher purity and having more rapid buildup than other methods of the prior art.
- Research Organization:
- SLAC National Accelerator Laboratory (SLAC), Menlo Park, CA (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC03-76SF00515
- Assignee:
- The United States of America as represented by the United States Department of Energy (Washington, DC)
- Patent Number(s):
- H000566
- Application Number:
- 06/804680
- OSTI ID:
- 1176591
- Resource Relation:
- Patent File Date: 1985 Dec 04
- Country of Publication:
- United States
- Language:
- English
Similar Records
New radio frequency technique for deposition of hard carbon films
Biased deposition of Nb-ON-Cu for SRF accelerators, Final Report