Nanofabrication
Patent
·
OSTI ID:1176141
Pathways to rapid and reliable fabrication of three-dimensional nanostructures are provided. Simple methods are described for the production of well-ordered, multilevel nanostructures. This is accomplished by patterning block copolymer templates with selective exposure to a radiation source. The resulting multi-scale lithographic template can be treated with post-fabrication steps to produce multilevel, three-dimensional, integrated nanoscale media, devices, and systems.
- Research Organization:
- Univ. of Massachusetts, Amherst, MA (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- FG02-96ERA45612; DMR-9809365; CTS-9871782
- Assignee:
- University of Massachusetts (Boston, MA)
- Patent Number(s):
- 7,189,435
- Application Number:
- 10/098,222
- OSTI ID:
- 1176141
- Resource Relation:
- Patent File Date: 2002 Mar 14
- Country of Publication:
- United States
- Language:
- English
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