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Title: Nanofabrication

Patent ·
OSTI ID:1176141

Pathways to rapid and reliable fabrication of three-dimensional nanostructures are provided. Simple methods are described for the production of well-ordered, multilevel nanostructures. This is accomplished by patterning block copolymer templates with selective exposure to a radiation source. The resulting multi-scale lithographic template can be treated with post-fabrication steps to produce multilevel, three-dimensional, integrated nanoscale media, devices, and systems.

Research Organization:
Univ. of Massachusetts, Amherst, MA (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
FG02-96ERA45612; DMR-9809365; CTS-9871782
Assignee:
University of Massachusetts (Boston, MA)
Patent Number(s):
7,189,435
Application Number:
10/098,222
OSTI ID:
1176141
Resource Relation:
Patent File Date: 2002 Mar 14
Country of Publication:
United States
Language:
English

References (23)

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Fabrication of patterned media for high density magnetic storage
  • Ross, C. A.; Smith, Henry I.; Savas, T.
  • Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 17, Issue 6 https://doi.org/10.1116/1.590974
journal January 1999
Magnetic properties of self-assembled Co nanowires of varying length and diameter journal May 2000
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Magnetic block array for patterned magnetic media journal February 2001

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