Spatially controlled, in situ synthesis of polymers
An in situ polymer microstructure formation method. The monomer mixture is polymerized in a solvent/precipitant through exposure to ionizing radiation in the absence any chemical mediators. If an exposure mask is employed to block out certain regions of the radiation cross section, then a patterned microstructure is formed. The polymerization mechanism is based on the so-called free-radical retrograde-precipitation polymerization process, in which polymerization occurs while the system is phase separating above the lower critical solution temperature. This method was extended to produce a crosslinked line grid-pattern of poly (N-isopropylacrylamide), which has been known to have thermoreversible properties.
- Research Organization:
- Univ. of Chicago, IL (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- W-31-109-ENG-38
- Assignee:
- University Of Chicago
- Patent Number(s):
- 6,869,983
- Application Number:
- 10/458,344
- OSTI ID:
- 1175284
- Country of Publication:
- United States
- Language:
- English
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