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Title: Long working distance interference microscope

Patent ·
OSTI ID:1174810
; ;

Disclosed is a long working distance interference microscope suitable for three-dimensional imaging and metrology of MEMS devices and test structures on a standard microelectronics probe station. The long working distance of 10-30 mm allows standard probes or probe cards to be used. This enables nanometer-scale 3-D height profiles of MEMS test structures to be acquired across an entire wafer. A well-matched pair of reference/sample objectives is not required, significantly reducing the cost of this microscope, as compared to a Linnik microinterferometer.

Research Organization:
Sandia National Lab. (SNL-CA), Livermore, CA (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC04-94AL85000
Assignee:
Sandia Corporation (Albuquerque, NM)
Patent Number(s):
6,721,094
Application Number:
09/800,047
OSTI ID:
1174810
Country of Publication:
United States
Language:
English

References (6)

Phase-shifting polarization interferometry for microstructure inspection conference August 1999
Stroboscopic interferometer system for dynamic MEMS characterization journal December 2000
Integrated Platform for Testing MEMS Mechanical Properties at the Wafer Scale by the IMaP Methodology book January 2001
Linnik microscope imaging of integrated circuit structures journal January 1996
Small displacement analysis of microaccelerometer by integrated phase-shifting method conference August 1999
Nanometer resolution of three-dimensional motions using video interference microscopy
  • Hemmert, W.; Mermelstein, M. S.; Freeman, D. M.
  • Technical Digest. IEEE International MEMS 99 Conference. Twelfth IEEE International Conference on Micro Electro Mechanical Systems (Cat. No.99CH36291) https://doi.org/10.1109/MEMSYS.1999.746842
conference January 1999

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