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Title: Biasing, operation and parasitic current limitation in single device equivalent to CMOS, and other semiconductor systems

Patent ·
OSTI ID:1174501

Disclosed are semiconductor devices including at least one junction which is rectifying whether the semiconductor is caused to be N or P-type, by the presence of applied gate voltage field induced carriers in essentially intrinsic, essentially homogeneously simultaneously containing both N and P-type metallurgical dopants at substantially equal doping levels, essentially homogeneously simultaneously containing both N and P-type metallurgical dopants at different doping levels, and containing a single metallurgical doping type, and functional combinations thereof. In particular, inverting and non-inverting gate voltage channel induced semiconductor single devices with operating characteristics similar to conventional multiple device CMOS systems, which can be operated as modulators, are disclosed as are a non-latching SCR and an approach to blocking parasitic currents utilizing material(s) which form rectifying junctions with both N and P-type semiconductor whether metallurigically or field induced.

Research Organization:
~Individually Owned Patent
Sponsoring Organization:
USDOE
DOE Contract Number:
FG47-93R701314
Assignee:
Welch, James D.
Patent Number(s):
6,624,493
Application Number:
09/716,046
OSTI ID:
1174501
Country of Publication:
United States
Language:
English

References (4)

Etched Schottky-barrier m.o.s.f.e.t.s using a single mask journal January 1971
Experimental investigation of a PtSi source and drain field emission transistor journal September 1995
Sub-40 nm PtSi Schottky source/drain metal–oxide–semiconductor field-effect transistors journal February 1999
SB-IGFET: An insulated-gate field-effect transistor using Schottky barrier contacts for source and drain journal January 1968