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Title: High Temperature Annealing of the Interface State Component of Negative-Bias Temperature Instability (NBTI) in MOSFET Devices.

Conference ·
OSTI ID:1082760

Abstract not provided.

Research Organization:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Organization:
USDOE National Nuclear Security Administration (NNSA)
DOE Contract Number:
AC04-94AL85000
OSTI ID:
1082760
Report Number(s):
SAND2013-4638C; 456150
Resource Relation:
Conference: Proposed for presentation at the Electrochemical Society Meeting held October 27 - November 1, 2013 in San Francisco, CA.
Country of Publication:
United States
Language:
English