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Title: Self-assembly of block copolymers on topographically patterned polymeric substrates

Abstract

Highly-ordered block copolymer films are prepared by a method that includes forming a polymeric replica of a topographically patterned crystalline surface, forming a block copolymer film on the topographically patterned surface of the polymeric replica, and annealing the block copolymer film. The resulting structures can be used in a variety of different applications, including the fabrication of high density data storage media. The ability to use flexible polymers to form the polymeric replica facilitates industrial-scale processes utilizing the highly-ordered block copolymer films.

Inventors:
 [1];  [1];  [1];  [2]
  1. Amherst, MA
  2. Berkeley, CA
Publication Date:
Research Org.:
Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States); University of Massachusetts, Boston, MA (United States); Univ. of California, Berkeley, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1062723
Patent Number(s):
8,247,033
Application Number:
12/553,484
Assignee:
The University of Massachusetts (Boston, MA); The Regents of the University of California (Oakland, CA)
DOE Contract Number:  
AC02-05CH11231
Resource Type:
Patent
Resource Relation:
Patent File Date: 2009 Sep 03
Country of Publication:
United States
Language:
English

Citation Formats

Russell, Thomas P, Park, Soojin, Lee, Dong Hyun, and Xu, Ting. Self-assembly of block copolymers on topographically patterned polymeric substrates. United States: N. p., 2012. Web.
Russell, Thomas P, Park, Soojin, Lee, Dong Hyun, & Xu, Ting. Self-assembly of block copolymers on topographically patterned polymeric substrates. United States.
Russell, Thomas P, Park, Soojin, Lee, Dong Hyun, and Xu, Ting. 2012. "Self-assembly of block copolymers on topographically patterned polymeric substrates". United States. https://www.osti.gov/servlets/purl/1062723.
@article{osti_1062723,
title = {Self-assembly of block copolymers on topographically patterned polymeric substrates},
author = {Russell, Thomas P and Park, Soojin and Lee, Dong Hyun and Xu, Ting},
abstractNote = {Highly-ordered block copolymer films are prepared by a method that includes forming a polymeric replica of a topographically patterned crystalline surface, forming a block copolymer film on the topographically patterned surface of the polymeric replica, and annealing the block copolymer film. The resulting structures can be used in a variety of different applications, including the fabrication of high density data storage media. The ability to use flexible polymers to form the polymeric replica facilitates industrial-scale processes utilizing the highly-ordered block copolymer films.},
doi = {},
url = {https://www.osti.gov/biblio/1062723}, journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Aug 21 00:00:00 EDT 2012},
month = {Tue Aug 21 00:00:00 EDT 2012}
}