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Title: Fully Integrated Applications of Thin Films on Low Temperature Cofired Ceramic (LTCC)

Conference ·
OSTI ID:1042651

Thin film multilayers have previously been introduced on multilayer low temperature cofired ceramic (LTCC), as well as initial thin film capacitors on LTCC. The ruggedness of a multipurpose Ti-Cu-Pt-Au stack for connectivity and RF conductivity has continued to benefit fabrication and reliability in state of-the-art modules, while the capacitors have followed the traditional Metal-Insulator-Metal (MIM) style. The full integration of thin film passives with thin film connectivity traces is presented. Certain passives, such as capacitors, require specifically tailored and separately patterned thin film (multi-)layers, including a dielectric. Different capacitance values are achieved by variation of both the insulator layer thickness and the active area of the capacitor. Other passives, such as filters, require only the conductor - a single thin film multilayer. This can be patterned from the same connectivity thin film material (Ti-Cu-Pt-Au), or a specially tailored thin film material (e.g. Ti-Cu-Au) can be deposited. Both versions are described, including process and integration details. Examples are discussed, ranging from patterning for maximum tolerances, to space and performance-optimized designs. Cross-sectional issues associated with integration are also highlighted in the discussion.

Research Organization:
Kansas City Plant (KCP), Kansas City, MO (United States)
Sponsoring Organization:
USDOE National Nuclear Security Administration (NNSA)
DOE Contract Number:
DE-AC04-01AL66850
OSTI ID:
1042651
Report Number(s):
KCP-613-9120; TRN: US201212%%863
Resource Relation:
Conference: 8th International Conference and Exhibition on Ceramic Interconnect and Ceramic Microsystems Technologies (CICMT 2012); IMAPS/ACerS; April 16-19-2012, Radisson Blue Hotel, Erfurt, Germany
Country of Publication:
United States
Language:
English

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