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Title: Method for generating small and ultra small apertures, slits, nozzles and orifices

Patent ·
OSTI ID:1042631

A method and device for one or more small apertures, slits, nozzles and orifices, preferably having a high aspect ratio. In one embodiment, one or more alternating layers of sacrificial layers and blocking layers are deposited onto a substrate. Each sacrificial layer is made of a material which preferably allows a radiation to substantially pass through. Each blocking layer is made of a material which substantially blocks the radiation.

Research Organization:
Argonne National Laboratory (ANL), Argonne, IL (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC02-06CH11357
Assignee:
The United States of America as represented by the United States Department of Energy (Washington, DC)
Patent Number(s):
8,182,870
Application Number:
12/128,696
OSTI ID:
1042631
Country of Publication:
United States
Language:
English

References (1)

Short focal length Kirkpatrick-Baez mirrors for a hard x-ray nanoprobe journal November 2005

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