Nano-soldering to single atomic layer
Patent
·
OSTI ID:1029265
- Berkeley, CA
- Kensington, CA
A simple technique to solder submicron sized, ohmic contacts to nanostructures has been disclosed. The technique has several advantages over standard electron beam lithography methods, which are complex, costly, and can contaminate samples. To demonstrate the soldering technique graphene, a single atomic layer of carbon, has been contacted, and low- and high-field electronic transport properties have been measured.
- Research Organization:
- Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC02-05CH11231
- Assignee:
- The Regents of the University of California (Oakland, CA)
- Patent Number(s):
- 8,033,445
- Application Number:
- 12/270,643
- OSTI ID:
- 1029265
- Country of Publication:
- United States
- Language:
- English
Lithography-free fabrication of graphene devices
|
journal | April 2007 |
Measurement of Scattering Rate and Minimum Conductivity in Graphene
|
journal | December 2007 |
Methods for fabricating Ohmic contacts to nanowires and nanotubes
|
journal | January 2006 |
Detection of individual gas molecules adsorbed on graphene
|
journal | July 2007 |
Soldering to a single atomic layer
|
journal | November 2007 |
| Handbook of Microlithography, Micromachining, and Microfabrication, Volume 2: Micromachining and Microfabrication | book | October 1997 |
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OSTI ID:1029265