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Title: Microstructural characterization of iron implanted sapphire nanocomposites

Abstract

Nanocomposites of iron in sapphire ({alpha}-Al{sub 2}O{sub 3}) prepared by ion implantation have been studied as a model to investigate the potential of such materials for applications in high technology areas. The implantation was performed with 160 keV ions at several doses; the nanocomposites were then annealed at selected temperatures between 700 and 1,400 C in an Ar-4%H{sub 2} atmosphere for 1 hour. Rutherford backscattering spectroscopy and high resolution transmission electron microscopy (TEM) were used to characterize the structure of these nanocomposites. Measurements showed that damage depth extended to about 300 nm and the embedded iron extended to about 200 nm. This region became amorphous when the fluence reaches 2 {times} 10{sup 17} Fe/cm{sup 2} at this energy. Thermal annealing could be used to restore the crystallinity to the damaged near-surface region, to form the metallic colloids, and also to coarsen the precipitates. In the case of high dose implantation, oriented precipitates with diameters of 2 to 3 nm were identified by TEM techniques as {alpha}-Fe which had the following orientation relationship with the sapphire matrix: <111>{sub Fe} {parallel} <310>{sub Sapphire} and {l_brace}01{bar 1}{r_brace}{sub Fe} {parallel} {l_brace}006{r_brace}{sub Sapphire}. The optical density and luminescence spectra were also measured. The predominant defectsmore » were oxygen vacancies with two electrons (F center) at the known absorption peak of 200 nm.« less

Authors:
;  [1]; ; ; ; ;  [2]
  1. Univ. of Tennessee, Knoxville, TN (United States). Dept. of Materials Science and Engineering
  2. Oak Ridge National Lab., TN (United States)
Publication Date:
Research Org.:
Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
Sponsoring Org.:
USDOE, Washington, DC (United States)
OSTI Identifier:
102181
Report Number(s):
CONF-941144-170
ON: DE95014260; TRN: 95:020279
DOE Contract Number:  
AC05-84OR21400
Resource Type:
Technical Report
Resource Relation:
Conference: Fall meeting of the Materials Research Society (MRS), Boston, MA (United States), 28 Nov - 9 Dec 1994; Other Information: PBD: [1994]
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; COMPOSITE MATERIALS; MICROSTRUCTURE; OPTICAL PROPERTIES; IRON; ALUMINIUM OXIDES; ION IMPLANTATION; IRON IONS; CONTROLLED ATMOSPHERES; PHYSICAL RADIATION EFFECTS; AMORPHOUS STATE; PRECIPITATION; RADIATION DOSES; IRON-ALPHA; GRAIN ORIENTATION; EXPERIMENTAL DATA

Citation Formats

Ren, S X, McHargue, C J, Allard, L F, Chen, Y, Hunn, J D, Lucas, B N, and Williams, R K. Microstructural characterization of iron implanted sapphire nanocomposites. United States: N. p., 1994. Web. doi:10.2172/102181.
Ren, S X, McHargue, C J, Allard, L F, Chen, Y, Hunn, J D, Lucas, B N, & Williams, R K. Microstructural characterization of iron implanted sapphire nanocomposites. United States. https://doi.org/10.2172/102181
Ren, S X, McHargue, C J, Allard, L F, Chen, Y, Hunn, J D, Lucas, B N, and Williams, R K. 1994. "Microstructural characterization of iron implanted sapphire nanocomposites". United States. https://doi.org/10.2172/102181. https://www.osti.gov/servlets/purl/102181.
@article{osti_102181,
title = {Microstructural characterization of iron implanted sapphire nanocomposites},
author = {Ren, S X and McHargue, C J and Allard, L F and Chen, Y and Hunn, J D and Lucas, B N and Williams, R K},
abstractNote = {Nanocomposites of iron in sapphire ({alpha}-Al{sub 2}O{sub 3}) prepared by ion implantation have been studied as a model to investigate the potential of such materials for applications in high technology areas. The implantation was performed with 160 keV ions at several doses; the nanocomposites were then annealed at selected temperatures between 700 and 1,400 C in an Ar-4%H{sub 2} atmosphere for 1 hour. Rutherford backscattering spectroscopy and high resolution transmission electron microscopy (TEM) were used to characterize the structure of these nanocomposites. Measurements showed that damage depth extended to about 300 nm and the embedded iron extended to about 200 nm. This region became amorphous when the fluence reaches 2 {times} 10{sup 17} Fe/cm{sup 2} at this energy. Thermal annealing could be used to restore the crystallinity to the damaged near-surface region, to form the metallic colloids, and also to coarsen the precipitates. In the case of high dose implantation, oriented precipitates with diameters of 2 to 3 nm were identified by TEM techniques as {alpha}-Fe which had the following orientation relationship with the sapphire matrix: <111>{sub Fe} {parallel} <310>{sub Sapphire} and {l_brace}01{bar 1}{r_brace}{sub Fe} {parallel} {l_brace}006{r_brace}{sub Sapphire}. The optical density and luminescence spectra were also measured. The predominant defects were oxygen vacancies with two electrons (F center) at the known absorption peak of 200 nm.},
doi = {10.2172/102181},
url = {https://www.osti.gov/biblio/102181}, journal = {},
number = ,
volume = ,
place = {United States},
year = {Sat Dec 31 00:00:00 EST 1994},
month = {Sat Dec 31 00:00:00 EST 1994}
}