skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Synchrotron radiation induced x-ray micro analysis: A realistic alternative for electron- and ion beam microscopy?

Abstract

Synchrotron Radiation induced X-ray micro Fluorescence analysis ({mu}-SRXRF) is compared with more conventional microanalytical techniques such as Secondary Ion Microscopy (SIMS) and Electron Probe X-ray Microanalysis (EPXMA) for two typical microanalytical applications. SRXRF and EPXMA are employed for the analysis of individual particles, showing the complementary character of both techniques. By means of element mapping of trace constituents in a heterogeneous feldspar, the strong and weak points of SRXRF in comparison to EPXMA and SIMS are illustrated. The most striking difference between SRXRF and the other two microanalytical methods is the ability of SRXRF to probe deep into the investigated Material, whereas SIMS and EPXMA only investigate the upper surface of the material. The possibilities of SRXRF at third generation synchrotron rings is also briefly discussed.

Authors:
;  [1]; ;  [2]
  1. Universitaire Instelling Antwerpen, Antwerp (Belgium). Dept. of Chemistry
  2. Brookhaven National Lab., Upton, NY (United States)
Publication Date:
Research Org.:
Brookhaven National Lab., Upton, NY (United States)
Sponsoring Org.:
USDOE, Washington, DC (United States); National Science Foundation, Washington, DC (United States); Belgian National Science Fund (Belgium)
OSTI Identifier:
10190439
Report Number(s):
BNL-48003; CONF-9208150-1
ON: DE93001975; CNN: Grant Nr. 2009291N; Grant EAR 89-14669
DOE Contract Number:  
AC02-76CH00016
Resource Type:
Conference
Resource Relation:
Conference: 27. annual meeting of the Microbeam Analysis Society (MAS) (United States) and the 19th annual meeting of the Microscopical Society of Canada (MSC),Boston, MA (United States),Aug 1992; Other Information: DN: To be published in The Microbeam Analysis Journal; PBD: [1992]
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; 43 PARTICLE ACCELERATORS; X-RAY FLUORESCENCE ANALYSIS; COMPARATIVE EVALUATIONS; ION MICROSCOPY; ELECTRON MICROPROBE ANALYSIS; FLUORESCENCE SPECTROSCOPY; ELEMENTS; TRACE AMOUNTS; SENSITIVITY; MULTI-ELEMENT ANALYSIS; SYNCHROTRON RADIATION; ALUMINIUM; SODIUM; POTASSIUM; SILICON; IRON; AEROSOLS; 665100; 430400; NUCLEAR TECHNIQUES IN CONDENSED MATTER PHYSICS; STORAGE RINGS

Citation Formats

Janssens, K, Adams, F, Rivers, M L, and Jones, K W. Synchrotron radiation induced x-ray micro analysis: A realistic alternative for electron- and ion beam microscopy?. United States: N. p., 1992. Web.
Janssens, K, Adams, F, Rivers, M L, & Jones, K W. Synchrotron radiation induced x-ray micro analysis: A realistic alternative for electron- and ion beam microscopy?. United States.
Janssens, K, Adams, F, Rivers, M L, and Jones, K W. 1992. "Synchrotron radiation induced x-ray micro analysis: A realistic alternative for electron- and ion beam microscopy?". United States. https://www.osti.gov/servlets/purl/10190439.
@article{osti_10190439,
title = {Synchrotron radiation induced x-ray micro analysis: A realistic alternative for electron- and ion beam microscopy?},
author = {Janssens, K and Adams, F and Rivers, M L and Jones, K W},
abstractNote = {Synchrotron Radiation induced X-ray micro Fluorescence analysis ({mu}-SRXRF) is compared with more conventional microanalytical techniques such as Secondary Ion Microscopy (SIMS) and Electron Probe X-ray Microanalysis (EPXMA) for two typical microanalytical applications. SRXRF and EPXMA are employed for the analysis of individual particles, showing the complementary character of both techniques. By means of element mapping of trace constituents in a heterogeneous feldspar, the strong and weak points of SRXRF in comparison to EPXMA and SIMS are illustrated. The most striking difference between SRXRF and the other two microanalytical methods is the ability of SRXRF to probe deep into the investigated Material, whereas SIMS and EPXMA only investigate the upper surface of the material. The possibilities of SRXRF at third generation synchrotron rings is also briefly discussed.},
doi = {},
url = {https://www.osti.gov/biblio/10190439}, journal = {},
number = ,
volume = ,
place = {United States},
year = {Thu Oct 01 00:00:00 EDT 1992},
month = {Thu Oct 01 00:00:00 EDT 1992}
}

Conference:
Other availability
Please see Document Availability for additional information on obtaining the full-text document. Library patrons may search WorldCat to identify libraries that hold this conference proceeding.

Save / Share: