An advanced ECR ion source with a large uniformly distributed ECR plasma volume for multiply charged ion beam generation
- Oak Ridge National Lab., TN (United States)
- Mission Research Corp., Newington, VA (United States)
A new ECR ion source geometry has been conceived which uses a minimum-B magnetic mirror geometry consisting of a multi-cusp, magnetic field, to assist in confining the plasma radially, a flat central field for tuning to the ECR resonant condition, and specially tailored mirror fields in the end zones for confining the plasma in the axial direction. The magnetic field, designed to achieve an axially symmetric plasma ``volume`` with constant mod-B, extends over the length of the central field region. This design, which strongly contrasts with ``surface`` ECR zones characteristic of conventional ECR ion sources, results in dramatic increases in the adsorption of RF power, thereby increasing the electron temperature and ``hot`` electron population within the ionization volume of the source. The ECR zone is concentrated symmetrically around the axis of symmetry and along the length of the plasma volume rather than in thin surface layers located off-axis as is the case in conventional ECR ion sources. The creation of a ``volume`` rather than a ``surface`` ECR zone and its distribution relative to the optical axis where the ions of interest are extracted is commensurate with the generation of higher beam intensities, higher charge states and a higher degree of ionization. The new ECR ion source concept has been computationally designed through the use of magnet design codes, plasma-dispersion sources, and particle-in-cell codes. A summary of the design attributes of the source is given in this report.
- Research Organization:
- Oak Ridge National Lab., TN (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- AC05-84OR21400
- OSTI ID:
- 10188234
- Report Number(s):
- CONF-9406180-4; ON: DE95001078; TRN: 94:021064
- Resource Relation:
- Conference: 6. international symposium on electron beam ion sources and their applications,Stockholm (Sweden),20-23 Jun 1994; Other Information: PBD: [1994]
- Country of Publication:
- United States
- Language:
- English
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