Photoconductivity measurements of x-ray absorption fine structures in liquids in the soft x-ray region: Si and Cl K-edge
Conference
·
OSTI ID:10127263
- University of Western Ontario, London, ON (Canada). Dept. of Chemistry
- Brookhaven National Lab., Upton, NY (United States)
- Chicago Univ., IL (United States)
Photoconductivity measurements of X-ray absorption fine structures (XAFS) at the Si and Cl K-edge have been carried out in a liquid cell for (CH{sub 3}){sub 4},Si [(CH{sub 3}){sub 3}Si]{sub 4}Si and eitheras a pure liquid or 2,2,4-trimethylpentane solution. It is found that for the pure liquids and their concentrated hydrocarbon solutions, all K-edge XAFS spectra are inverted as expected under the condition of total absorption. A sharp conductivity dip is also observed in CCl{sub 4} at the Cl K-edge. The concentration dependence of the XAFS spectrum of CCl{sub 4} is reported. These results are discussed in terms of soft X-ray induced ion yields of the solute and solvent molecules in liquids.
- Research Organization:
- Brookhaven National Lab., Upton, NY (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States); National Science Foundation, Washington, DC (United States); Natural Sciences and Engineering Research Council of Canada, Ottawa, ON (Canada); Ontario Centre for Materials Research, Kingston, ON (Canada)
- DOE Contract Number:
- AC02-76CH00016
- OSTI ID:
- 10127263
- Report Number(s):
- BNL-48487; CONF-9208160-6; ON: DE93006670
- Resource Relation:
- Conference: 7. international conference on x-ray absorption fine structure,Kobe (Japan),23-29 Aug 1992; Other Information: PBD: [1992]
- Country of Publication:
- United States
- Language:
- English
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