Plasma surface cleaning using microwave plasmas
- Oak Ridge National Lab., TN (United States)
- Oak Ridge Y-12 Plant, TN (United States)
In a microwave electron cyclotron resonance (ECR) plasma source, reactive plasmas of oxygen and its mixture with argon are used for plasma-cleaning experiments. Aluminum test samples (0.95 {times} 1.9 cm) were coated with thin films ({le} 20 {mu}m in thickness) of Shell Vitrea oil and cleaned by using such reactive plasmas. The plasma cleaning was done in various discharge conditions with fixed microwave power, rf power, biased potential, gas pressures (0.5 and 5 mtorr), and operating time up to 35 min. The status of plasma cleaning has been monitored by using mass spectroscopy. Mass loss of the samples after plasma cleaning was measured to estimate cleaning rates. Measured clean rates of low pressure (0.5 mtorr) argon/oxygen plasmas were as high as 2.7 {mu}/min. X-ray photoelectron spectroscopy was used to determine cleanliness of the sample surfaces and confirm the effectiveness of plasma cleaning in achieving atomic levels of surface cleanliness. In this paper, significant results are reported and discussed.
- Research Organization:
- Oak Ridge Y-12 Plant, TN (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- AC05-84OS21400
- OSTI ID:
- 10104283
- Report Number(s):
- Y/DV-1298; CONF-9311110-1; ON: DE94002754
- Resource Relation:
- Conference: Annual Vacuum Society science symposium,Triangle Park, NC (United States),15-19 Nov 1993; Other Information: PBD: [1993]
- Country of Publication:
- United States
- Language:
- English
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