Adhesive particle shielding

Patent · Tue Jan 06 00:00:00 EST 2009

OSTI ID:985861

Klebanoff, Leonard Elliott ^[1]; Rader, Daniel John ^[2]; Walton, Christopher ^[3]; Folta, James ^[4]

---

1. Dublin, CA
2. Albuquerque, NM
3. Berkeley, CA
4. Livermore, CA

An efficient device for capturing fast moving particles has an adhesive particle shield that includes (i) a mounting panel and (ii) a film that is attached to the mounting panel wherein the outer surface of the film has an adhesive coating disposed thereon to capture particles contacting the outer surface. The shield can be employed to maintain a substantially particle free environment such as in photolithographic systems having critical surfaces, such as wafers, masks, and optics and in the tools used to make these components, that are sensitive to particle contamination. The shield can be portable to be positioned in hard-to-reach areas of a photolithography machine. The adhesive particle shield can incorporate cooling means to attract particles via the thermophoresis effect.

• Research Organization: National Nuclear Security Agency Service Center
• Sponsoring Organization: USDOE
• DOE Contract Number: AC04-94AL85000
• Assignee: EUV LLC (Santa Clara, CA)
• Patent Number(s): 7,473,301
• Application Number: 10/245,218
• OSTI ID: 985861
• Country of Publication: United States
• Language: English

Related Subjects

47 OTHER INSTRUMENTATION