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Title: Impacts of SiO2 planarization on optical thin film properties and laser damage resistance

Conference ·
OSTI ID:1331458

Research Organization:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC52-07NA27344
OSTI ID:
1331458
Report Number(s):
LLNL-CONF-703780
Resource Relation:
Conference: Presented at: SPIE Laser Damage, Boulder, CO, United States, Sep 26 - Sep 28, 2016
Country of Publication:
United States
Language:
English