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Title: Level-set multilayer growth model for predicting printability of buried native extreme ultraviolet mask defects

Journal Article · · Journal of Vacuum Science and Technology. B, Nanotechnology and Microelectronics
DOI:https://doi.org/10.1116/1.4913315· OSTI ID:1240628

Research Organization:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Sponsoring Organization:
Materials Sciences Division
OSTI ID:
1240628
Report Number(s):
LBNL-176705; ir:176705
Journal Information:
Journal of Vacuum Science and Technology. B, Nanotechnology and Microelectronics, Vol. 33, Issue 2; ISSN 2166-2746
Publisher:
American Vacuum Society/AIP
Country of Publication:
United States
Language:
English

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