Annealing influence on the magnetostructural transition in Gd5Si1.3Ge2.7 thin films

Pires, A. L.; Belo, J. H.; Gomes, I. T.; Hadimani, R. L.; Jiles, D. C.; Fernandes, L.; Tavares, P. B.; Araújo, J. P.; Lopes, A. M. L.; Pereira, A. M.

doi:10.1016/j.matlet.2015.05.029

Title: Annealing influence on the magnetostructural transition in Gd₅Si_1.3Ge_2.7 thin films

Journal Article · Tue May 19 00:00:00 EDT 2015 · Materials Letters

DOI:https://doi.org/10.1016/j.matlet.2015.05.029· OSTI ID:1227309

Pires, A. L. ^[1]; Belo, J. H. ^[2]; Gomes, I. T. ^[2]; Hadimani, R. L. ^[3]; Jiles, D. C. ^[3]; Fernandes, L. ^[4]; Tavares, P. B. ^[4]; Araújo, J. P. ^[2]; Lopes, A. M. L. ^[1]; Pereira, A. M. ^[2]

Centro de Fisica Nuclear da Univ. de Lisboa, Lisboa (Portugal); Departamento de Fisica e Astronomia da Faculdade de Ciencias da Univ. do Porto, Porto (Portugal)
Departamento de Fisica e Astronomia da Faculdade de Ciencias da Univ. do Porto, Porto (Portugal)
Iowa State Univ., Ames, IA (United States)
Univ. de Tras-os-Montes e Alto Douro, VilaReal (Portugal)

Due to the emerging cooling possibilities at the micro and nanoscale, such as the fast heat exchange rate, the effort to synthesize and optimize the magnetocaloric materials at these scales is rapidly growing. Here, we report the effect of different thermal treatments on Gd₅Si_1.3Ge_2.7 thin film in order to evaluate the correlation between the crystal structure, magnetic phase transition and magnetocaloric effect. For annealing temperatures higher than 500ºC, the samples showed a typical paramagnetic behavior. On the other hand, thermal treatments below 500ºC promoted the suppression of the magnetostructural transition at 190 K, while the magnetic transition around 249 K is not affected. This magnetostructural transition extinction was reflected in the magnetocaloric behavior and resulted in a drastic decrease in the entropy change peak value (of about 68%). An increase in T_C was reported, proving that at the nanoscale, heat treatments may be a useful tool to optimize the magnetocaloric properties in Gd₅(Si_xGe_1-x)₄ thin films.

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Research Organization:: Ames Laboratory (AMES), Ames, IA (United States)

Sponsoring Organization:: USDOE Office of Nuclear Energy (NE), Fuel Cycle Technologies (NE-5); USDOE

Grant/Contract Number:: PTDC/CTM-NAN/115125/2009; EXPL/EMS-ENE/2315/2013; FEDER/POCTIn0155/94; SFRH/BD/88440/2012; AC02-07CH11358

OSTI ID:: 1227309

Alternate ID(s):: OSTI ID: 1245677

Report Number(s):: IS-J-8833; PII: S0167577X15007429

Journal Information:: Materials Letters, Vol. 159, Issue C; ISSN 0167-577X

Publisher:: ElsevierCopyright Statement

Country of Publication:: United States

Language:: English

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Cited by: 9 works

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Magnetocaloric materials: From micro- to nanoscale Belo, João H.; Pires, Ana L.; Araújo, João P. Journal of Materials Research, Vol. 34, Issue 1 https://doi.org/10.1557/jmr.2018.352	journal	November 2018
Giant negative thermal expansion at the nanoscale in the multifunctional material $G d_{5} {(Si, Ge)}_{4}$ Belo, João H.; Pires, Ana L.; Gomes, Isabel T. Physical Review B, Vol. 100, Issue 13 https://doi.org/10.1103/physrevb.100.134303	journal	October 2019
Negative Thermal Expansion in the Materials With Giant Magnetocaloric Effect Hu, Fengxia; Shen, Feiran; Hao, Jiazheng Frontiers in Chemistry, Vol. 6 https://doi.org/10.3389/fchem.2018.00438	journal	September 2018

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