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Title: Recovering effective amplitude and phase roughness of EUV masks

Journal Article · · Proc. SPIE
DOI:https://doi.org/10.1117/12.2027828· OSTI ID:1164379

Research Organization:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Sponsoring Organization:
USDOE Office of Science (SC)
DOE Contract Number:
DE-AC02-05CH11231
OSTI ID:
1164379
Report Number(s):
LBNL-6514E
Journal Information:
Proc. SPIE, Vol. 8880; Related Information: Journal Publication Date: Sept. 2013
Country of Publication:
United States
Language:
English

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