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Title: Electronic properties of ultrananocrystalline diamond surfaces.

Journal Article · · Appl. Phys. Lett.
DOI:https://doi.org/10.1063/1.3340898· OSTI ID:993697

We have characterized ultrananocrystalline diamond films with different surface terminations by x-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), scanning tunneling microscopy (STM) and scanning tunneling spectroscopy (STS). The surface terminations were performed by plasma functionalization in atmospheres of hydrogen, fluorine, and oxygen. XPS proves the dense monolayer coverage of the surface functionalization. AFM and STM show low impact of the plasma treatment on the surface morphology. STS has been used to investigate the surface electronic properties, for H-terminated surfaces the electronic structure is dominated by the sp{sup 3} carbon phase of the grain surfaces; for O- and F-terminated surfaces, however, sp{sup 2} carbon from the grain boundaries seems to determine the surface band gap.

Research Organization:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Organization:
USDOE Office of Science (SC); Nanosystems Initiative Munich; TUM International Graduate School of Science and Engineering
DOE Contract Number:
DE-AC02-06CH11357
OSTI ID:
993697
Report Number(s):
ANL/MSD/JA-68117; TRN: US201023%%572
Journal Information:
Appl. Phys. Lett., Vol. 96, Issue Mar. 4, 2010
Country of Publication:
United States
Language:
ENGLISH