Multilayer growth in the APS rotary deposition system.
We report our progress in the growth of periodic and depth-graded multilayers in the APS rotary deposition system, a machine designed for fabrication of films tens of microns thick with thousands of layers. A computational method was employed to design depth-graded multilayers for use as wide-angular bandpass reflective optics. We present experimental results for a 154-layer WSi{sub 2}/Si multilayer system with bilayer thickness ranging from 2.2 nm to 5.5 nm that closely match theoretical flat-top reflectivity predictions of 9.8% from 15.6 mrad to 23.3 mrad at 8 keV.
- Research Organization:
- Argonne National Lab. (ANL), Argonne, IL (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC)
- DOE Contract Number:
- DE-AC02-06CH11357
- OSTI ID:
- 970791
- Report Number(s):
- ANL/XSD/CP-60081; TRN: US201003%%126
- Resource Relation:
- Conference: SPIE Optics and Photonics 2007; Aug. 26, 2007 - Aug. 30, 2007; San Diego, CA
- Country of Publication:
- United States
- Language:
- ENGLISH
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