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Title: Hall-Petch relationship in pulsed laser deposited nickel films.

Thin-film mechanical properties can be measured using nanoindentation combined with detailed finite element modeling. This technique was used for a study of very fine grained Ni films, formed using pulsed-laser deposition on fused silica, sapphire, and Ni substrates. The grain sizes in the films were characterized by electron microscopy, and the mechanical properties were determined by ultra-low load indentation, analyzed using finite element modeling to separate the mechanical properties of the thin layers from those of the substrates. Some Ni films were deposited at high temperature or annealed after deposition to enlarge the grain sizes. The observed hardnesses and grain sizes in these thin Ni films are consistent with the empirical Hall-Petch relationship for grain sizes ranging from a few micrometers to as small as 10 nm, suggesting that deformation occurs preferentially by dislocation movement even in such nanometer-size grains.
Authors:
;
Publication Date:
OSTI Identifier:
958382
Report Number(s):
SAND2003-2046J
TRN: US201002%%24
DOE Contract Number:
AC04-94AL85000
Resource Type:
Journal Article
Resource Relation:
Journal Name: Proposed for publication in Journal of Materials Research.
Research Org:
Sandia National Laboratories
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; NICKEL; ENERGY BEAM DEPOSITION; LASER RADIATION; THIN FILMS; GRAIN SIZE; MECHANICAL PROPERTIES; FINITE ELEMENT METHOD; DISLOCATIONS