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Title: Programmable imprint lithography template

A template for imprint lithography (IL) that reduces significantly template production costs by allowing the same template to be re-used for several technology generations. The template is composed of an array of spaced-apart moveable and individually addressable rods or plungers. Thus, the template can be configured to provide a desired pattern by programming the array of plungers such that certain of the plungers are in an "up" or actuated configuration. This arrangement of "up" and "down" plungers forms a pattern composed of protruding and recessed features which can then be impressed onto a polymer film coated substrate by applying a pressure to the template impressing the programmed configuration into the polymer film. The pattern impressed into the polymer film will be reproduced on the substrate by subsequent processing.
Authors:
 [1] ;  [2]
  1. (Oakland, CA)
  2. (Livermore, CA)
Publication Date:
OSTI Identifier:
908049
Report Number(s):
7,128,559
US patent application 10/756,978
DOE Contract Number:
AC04-94AL85000
Resource Type:
Patent
Research Org:
Sandia National Laboratories (SNL-CA), Livermore, CA
Sponsoring Org:
United States Department of Energy
Country of Publication:
United States
Language:
English