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Title: High-Aspect-Ratio Nanophotonic Components Fabricated by Cl(2) RIBE

We describe highly anisotropic reactive ion beam etching of nanophotonic structures in AlGaAs based on the ion beam divergence angle and chamber pressure. The divergence angle is shown to influence the shape of the upper portion of the etch while the chamber pressure controls the shape of the lower portion. This predictable region of parameter space resulted in highly anisotropic nanostructures. Deeply etched distributed Bragg reflectors are etched to an aspect ratio of 8:1 with 100 nm trench widths. The profile of the grating etch is straight with smooth sidewalls, flat bottoms, and squared corners. Two-dimensional photonic crystal post arrays are fabricated with smooth and vertical sidewalls, with structures as small as 180 nm in diameter and 2.0 {micro}m in height.
Authors:
; ;
Publication Date:
OSTI Identifier:
8798
Report Number(s):
SAND99-1745J
TRN: AH200117%%162
DOE Contract Number:
AC04-94AL85000
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Vacuum and Science Technology; Other Information: Submitted to Journal of Vacuum and Science Technology; PBD: 8 Jul 1999
Research Org:
Sandia National Labs., Albuquerque, NM (US); Sandia National Labs., Livermore, CA (US)
Sponsoring Org:
US Department of Energy (US)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 42 ENGINEERING; ALUMINIUM ARSENIDES; GALLIUM ARSENIDES; DIFFRACTION GRATINGS; ASPECT RATIO; ETCHING; ION BEAMS; PRESSURE CONTROL; SHAPE; CHLORINE; FABRICATION