Correlation between Microstructure and Mechanical Properties ofTiC Films Produced by Vacuum arc Deposition and Reactive MagnetronSputtering

Conference · Thu Jul 29 00:00:00 EDT 1999

OSTI ID:877598

Monteiro, O R; Delplancke-Ogletree, M P; Winand, R; Brown, I G

We have studied the synthesis of TiC films by vacuum arc deposition and reactive magnetron sputtering over a wide range of compositions. The films were deposited on silicon and tool steel. The films were characterized by various techniques: Auger electron and X-ray photoelectron spectroscopies, Rutherford backscattering, transmission electron diffraction and X-ray diffraction. Mechanical properties such as stress, adhesion, friction coefficient and wear resistance were obtained by carrying measurements of the curvature of the silicon substrate, pull tests, and ball-on-disk tests, respectively.

• Research Organization: Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
• Sponsoring Organization: USDOE Director, Office of Science
• DOE Contract Number: DE-AC02-05CH11231
• OSTI ID: 877598
• Report Number(s): LBNL-39179; R&D Project: 889001; TRN: US200608%%502
• Resource Relation: Conference: The 1997 Joint Summer Meeting of ASME, ASCE, andSES, Northwestern University, Evanston, Illinois, June 29 - July 2,1997
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ADHESION
BACKSCATTERING
DEPOSITION
ELECTRON DIFFRACTION
ELECTRONS
FRICTION
MAGNETRONS
MECHANICAL PROPERTIES
MICROSTRUCTURE
SILICON
SPUTTERING
SYNTHESIS
WEAR RESISTANCE
X-RAY DIFFRACTION
TiC sputtering thin films