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Title: Correlation between Microstructure and Mechanical Properties ofTiC Films Produced by Vacuum arc Deposition and Reactive MagnetronSputtering

We have studied the synthesis of TiC films by vacuum arc deposition and reactive magnetron sputtering over a wide range of compositions. The films were deposited on silicon and tool steel. The films were characterized by various techniques: Auger electron and X-ray photoelectron spectroscopies, Rutherford backscattering, transmission electron diffraction and X-ray diffraction. Mechanical properties such as stress, adhesion, friction coefficient and wear resistance were obtained by carrying measurements of the curvature of the silicon substrate, pull tests, and ball-on-disk tests, respectively.
Authors:
; ; ;
Publication Date:
OSTI Identifier:
877598
Report Number(s):
LBNL--39179
R&D Project: 889001; TRN: US200608%%502
DOE Contract Number:
DE-AC02-05CH11231
Resource Type:
Conference
Resource Relation:
Conference: The 1997 Joint Summer Meeting of ASME, ASCE, andSES, Northwestern University, Evanston, Illinois, June 29 - July 2,1997
Research Org:
Ernest Orlando Lawrence Berkeley NationalLaboratory, Berkeley, CA (US)
Sponsoring Org:
USDOE Director, Office of Science
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ADHESION; BACKSCATTERING; DEPOSITION; ELECTRON DIFFRACTION; ELECTRONS; FRICTION; MAGNETRONS; MECHANICAL PROPERTIES; MICROSTRUCTURE; SILICON; SPUTTERING; SYNTHESIS; WEAR RESISTANCE; X-RAY DIFFRACTION TiC sputtering thin films