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Title: Lamp system for uniform semiconductor wafer heating

A lamp system with a very soft high-intensity output is provided over a large area by water cooling a long-arc lamp inside a diffuse reflector of polytetrafluorethylene (PTFE) and titanium dioxide (TiO.sub.2) white pigment. The water is kept clean and pure by a one micron particulate filter and an activated charcoal/ultraviolet irradiation system that circulates and de-ionizes and biologically sterilizes the coolant water at all times, even when the long-arc lamp is off.
Authors:
 [1] ;  [1]
  1. (Livermore, CA)
Publication Date:
OSTI Identifier:
873810
Report Number(s):
US 6252203
DOE Contract Number:
W-7405-ENG-48
Resource Type:
Patent
Research Org:
Lawrence Livermore National Laboratory (LLNL), Livermore, CA
Country of Publication:
United States
Language:
English
Subject:
lamp; uniform; semiconductor; wafer; heating; lamp; soft; high-intensity; output; provided; water; cooling; long-arc; lamp; inside; diffuse; reflector; polytetrafluorethylene; ptfe; titanium; dioxide; white; pigment; water; kept; clean; pure; micron; particulate; filter; activated; charcoal; ultraviolet; irradiation; circulates; de-ionizes; biologically; sterilizes; coolant; water; times; long-arc; lamp; coolant water; activated charcoal; semiconductor wafer; titanium dioxide; particulate filter; water cooling; ultraviolet irradiation; long-arc lamp; long-arc lamp; diffuse reflector; soft high-intensity; uniform semiconductor; high-intensity output; lamp inside /219/118/362/392/