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Title: Reflective optical imaging system

Patent ·
OSTI ID:872814
 [1]
  1. Fairfield, CT
+ Show Author Affiliations

An optical system compatible with short wavelength (extreme ultraviolet) radiation comprising four reflective elements for projecting a mask image onto a substrate. The four optical elements are characterized in order from object to image as convex, concave, convex and concave mirrors. The optical system is particularly suited for step and scan lithography methods. The invention increases the slit dimensions associated with ringfield scanning optics, improves wafer throughput and allows higher semiconductor device density.

Research Organization:
Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
DOE Contract Number:
W-7405-ENG-48
Assignee:
Regents of University of California (Oakland, CA)
Patent Number(s):
US 6014252
OSTI ID:
872814
Country of Publication:
United States
Language:
English

References (3)

Design of reflective relay for soft x-ray lithography conference January 1991
Reflective systems design study for soft x-ray projection lithography journal November 1990
Optical system design issues in development of projection camera for EUV lithography conference May 1995

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Related Subjects

reflective
optical
imaging
compatible
wavelength
extreme
ultraviolet
radiation
comprising
elements
projecting
mask
image
substrate
characterized
convex
concave
mirrors
particularly
suited
step
scan
lithography
methods
increases
slit
dimensions
associated
ringfield
scanning
optics
improves
wafer
throughput
allows
semiconductor
device
density
reflective elements
concave mirrors
mask image
scan lithography
lithography methods
reflective optical
optical imaging
particularly suited
optical element
optical elements
extreme ultraviolet
semiconductor device
concave mirror
radiation comprising
reflective element
slit dimensions
scanning optics
device density
wafer throughput
dimensions associated
improves wafer
field scanning
/359/