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Title: Broad beam ion implanter

An ion implantation device for creating a large diameter, homogeneous, ion beam is described, as well as a method for creating same, wherein the device is characterized by extraction of a diverging ion beam and its conversion by ion beam optics to an essentially parallel ion beam. The device comprises a plasma or ion source, an anode and exit aperture, an extraction electrode, a divergence-limiting electrode and an acceleration electrode, as well as the means for connecting a voltage supply to the electrodes.
Authors:
 [1]
  1. (Hercules, CA)
Publication Date:
OSTI Identifier:
870632
Report Number(s):
US 5563418
DOE Contract Number:
AC03-76SF00098
Resource Type:
Patent
Research Org:
Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA
Country of Publication:
United States
Language:
English
Subject:
broad; beam; implanter; implantation; device; creating; diameter; homogeneous; beam; described; method; creating; device; characterized; extraction; diverging; beam; conversion; beam; optics; essentially; parallel; beam; device; comprises; plasma; source; anode; exit; aperture; extraction; electrode; divergence-limiting; electrode; acceleration; electrode; means; connecting; voltage; supply; electrodes; voltage supply; device comprises; exit aperture; extraction electrode; essentially parallel /250/