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Title: Negative ion beam injection apparatus with magnetic shield and electron removal means

A negative ion source is constructed to produce H.sup.- ions without using Cesium. A high percentage of secondary electrons that typically accompany the extracted H.sup.- are trapped and eliminated from the beam by permanent magnets in the initial stage of acceleration. Penetration of the magnetic field from the permanent magnets into the ion source is minimized. This reduces the destructive effect the magnetic field could have on negative ion production and extraction from the source. A beam expansion section in the extractor results in a strongly converged final beam.
Authors:
 [1] ;  [2] ;  [3]
  1. (Berkeley, CA)
  2. (Hayward, CA)
  3. (Hercules, CA)
Publication Date:
OSTI Identifier:
869604
Report Number(s):
US 5365070
DOE Contract Number:
AC03-76SF00098
Resource Type:
Patent
Research Org:
Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA
Country of Publication:
United States
Language:
English
Subject:
negative; beam; injection; apparatus; magnetic; shield; electron; removal; means; negative; source; constructed; produce; cesium; percentage; secondary; electrons; typically; accompany; extracted; trapped; eliminated; beam; permanent; magnets; initial; stage; acceleration; penetration; magnetic; field; permanent; magnets; source; minimized; reduces; destructive; effect; magnetic; field; negative; production; extraction; source; beam; expansion; section; extractor; results; strongly; converged; final; beam; beam injection; permanent magnet; permanent magnet; magnetic field; magnetic field; permanent magnets; permanent magnets; secondary electrons; secondary electron; removal means; injection apparatus; final beam; initial stage; magnetic shield /250/313/