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Title: Axial flow plasma shutter

A shutter (36) is provided for controlling a beam, or current, of charged particles in a device such as a thyratron (10). The substrate (38) defines an aperture (60) with a gap (32) which is placeable within the current. Coils (48) are formed on the substrate (38) adjacent the aperture (60) to produce a magnetic field for trapping the charged particles in or about aperture (60). The proximity of the coils (48) to the aperture (60) enables an effective magnetic field to be generated by coils (48) having a low inductance suitable for high frequency control. The substantially monolithic structure including the substrate (38) and coils (48) enables the entire shutter assembly (36) to be effectively located with respect to the particle beam.
Authors:
 [1]
  1. (Fort Collins, CO)
Publication Date:
OSTI Identifier:
866485
Report Number(s):
US 4721891
DOE Contract Number:
W-7405-ENG-36
Resource Type:
Patent
Research Org:
Los Alamos National Laboratory (LANL), Los Alamos, NM
Country of Publication:
United States
Language:
English
Subject:
axial; flow; plasma; shutter; shutter; 36; provided; controlling; beam; current; charged; particles; device; thyratron; 10; substrate; 38; defines; aperture; 60; gap; 32; placeable; current; coils; 48; formed; substrate; 38; adjacent; aperture; 60; produce; magnetic; field; trapping; charged; particles; aperture; 60; proximity; coils; 48; aperture; 60; enables; effective; magnetic; field; generated; coils; 48; inductance; suitable; frequency; control; substantially; monolithic; structure; including; substrate; 38; coils; 48; enables; entire; shutter; assembly; 36; effectively; located; respect; particle; beam; monolithic structure; structure including; particle beam; charged particles; charged particles; magnetic field; magnetic field; charged particle; charged particle; axial flow /315/313/