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Title: Liquid metal ion source and alloy for ion emission of multiple ionic species

A liquid metal ion source and alloy for the simultaneous ion evaporation of arsenic and boron, arsenic and phosphorus, or arsenic, boron and phosphorus. The ionic species to be evaporated are contained in palladium-arsenic-boron and palladium-arsenic-boron-phosphorus alloys. The ion source, including an emitter means such as a needle emitter and a source means such as U-shaped heater element, is preferably constructed of rhenium and tungsten, both of which are readily fabricated. The ion sources emit continuous beams of ions having sufficiently high currents of the desired species to be useful in ion implantation of semiconductor wafers for preparing integrated circuit devices. The sources are stable in operation, experience little corrosion during operation, and have long operating lifetimes.
 [1] ;  [2] ;  [3] ;  [4] ;  [4] ;  [4] ;  [5] ;  [5]
  1. (Thousand Oaks, CA)
  2. (Saugus, CA)
  3. (Oxnard, CA)
  4. (Los Alamos, NM)
  5. (McMinnville, OR)
Publication Date:
OSTI Identifier:
Report Number(s):
US 4670685
US patent application 06/851,755
DOE Contract Number:
Resource Type:
Country of Publication:
United States
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