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Title: Multilayer diffraction grating

This invention is for a reflection diffraction grating that functions at X-ray to VUV wavelengths and at normal angles of incidence. The novel grating is comprised of a laminar grating of period D with flat-topped grating bars. A multiplicity of layered synthetic microstructures, of period d and comprised of alternating flat layers of two different materials, are disposed on the tops of the grating bars of the laminar grating. In another embodiment of the grating, a second multiplicity of layered synthetic microstructures are also disposed on the flat faces, of the base of the grating, between the bars. D is in the approximate range from 3,000 to 50,000 Angstroms, but d is in the approximate range from 10 to 400 Angstroms. The laminar grating and the layered microstructures cooperatively interact to provide many novel and beneficial instrumentational advantages. 2 figs.
Authors:
Publication Date:
OSTI Identifier:
7266486
Report Number(s):
US 4915463; A
PPN: US 7-259564
DOE Contract Number:
W-7405-ENG-48
Resource Type:
Patent
Resource Relation:
Patent File Date: 18 Oct 1988
Country of Publication:
United States
Language:
English
Subject:
47 OTHER INSTRUMENTATION; DIFFRACTION GRATINGS; DESIGN; MEASURING INSTRUMENTS; FAR ULTRAVIOLET RADIATION; LAYERS; X RADIATION; ELECTROMAGNETIC RADIATION; GRATINGS; IONIZING RADIATIONS; RADIATIONS; ULTRAVIOLET RADIATION 440000* -- Instrumentation