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Title: Observation of dust particle growth and fallout in RF-excited silane discharges

Journal Article · · IEEE Transactions on Plasma Science (Institute of Electrical and Electronics Engineers); (United States)
DOI:https://doi.org/10.1109/27.279012· OSTI ID:7236366
 [1]; ; ;  [2];  [3]
  1. Plasma and Switching Technology, Erlangen (Germany). Siemens Research Lab. Technical Univ. of Munich, Garching (Germany)
  2. Plasma and Switching Technology, Erlangen (Germany). Siemens Research Lab.
  3. Technical Univ. of Munich, Garching (Germany). Inst. for Chemistry of Information Recording

Particles formed during plasma enhanced chemical vapor deposition of amorphous silicon thin films which fall to the film surface, either during or after the process, may have a severely deleterious effect on film properties. In order to understand the mechanisms of particle formation and fallout the authors have investigated the growth and dynamics of particles in RF discharges in pure silane. The diameter of particles formed within the first 20 s of the discharge was investigated by electron microscopy of substrates with fallen out particles. Furthermore the authors used a He-Ne laser in combination with a diode array camera to measure temporally and spatially resolved light scattering from particles and deduced their sinking speed after switching off the discharge. The results are compared to a theoretical model on the particle dynamics.

OSTI ID:
7236366
Journal Information:
IEEE Transactions on Plasma Science (Institute of Electrical and Electronics Engineers); (United States), Vol. 22:2; ISSN 0093-3813
Country of Publication:
United States
Language:
English