Observation of dust particle growth and fallout in RF-excited silane discharges
- Plasma and Switching Technology, Erlangen (Germany). Siemens Research Lab. Technical Univ. of Munich, Garching (Germany)
- Plasma and Switching Technology, Erlangen (Germany). Siemens Research Lab.
- Technical Univ. of Munich, Garching (Germany). Inst. for Chemistry of Information Recording
Particles formed during plasma enhanced chemical vapor deposition of amorphous silicon thin films which fall to the film surface, either during or after the process, may have a severely deleterious effect on film properties. In order to understand the mechanisms of particle formation and fallout the authors have investigated the growth and dynamics of particles in RF discharges in pure silane. The diameter of particles formed within the first 20 s of the discharge was investigated by electron microscopy of substrates with fallen out particles. Furthermore the authors used a He-Ne laser in combination with a diode array camera to measure temporally and spatially resolved light scattering from particles and deduced their sinking speed after switching off the discharge. The results are compared to a theoretical model on the particle dynamics.
- OSTI ID:
- 7236366
- Journal Information:
- IEEE Transactions on Plasma Science (Institute of Electrical and Electronics Engineers); (United States), Vol. 22:2; ISSN 0093-3813
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
14 SOLAR ENERGY
DUSTS
GRAIN GROWTH
SILICON
CHEMICAL VAPOR DEPOSITION
SILICON SOLAR CELLS
FABRICATION
CHEMICAL REACTORS
ELECTRIC DISCHARGES
EXPERIMENTAL DATA
PLASMA
CHEMICAL COATING
DATA
DEPOSITION
DIRECT ENERGY CONVERTERS
ELEMENTS
EQUIPMENT
INFORMATION
NUMERICAL DATA
PHOTOELECTRIC CELLS
PHOTOVOLTAIC CELLS
SEMIMETALS
SOLAR CELLS
SOLAR EQUIPMENT
SURFACE COATING
360601* - Other Materials- Preparation & Manufacture
140501 - Solar Energy Conversion- Photovoltaic Conversion