Apparatus and method for enhanced chemical processing in high pressure and atmospheric plasmas produced by high frequency electromagnetic waves
This paper describes an apparatus which creates a plasma for chemical processing of gaseous fluid. It comprises an electro-magnetic resonator cavity having first and second conductive walls and a resonant frequency; an electro-magnetic energy source which produces electro-magnetic energy having a frequency corresponding to the resonant frequency and a power level sufficient for breaking down the gaseous fluid and creating a plasma within the electro-magnetic resonator cavity; an electro-magnetic wave guiding structure connecting the electro-magnetic energy source to the first wall of the electro-magnetic cavity; the wave guiding structure having an intake port for introducing the gaseous fluid into the wave guiding structure; the second wall of the resonator cavity having an exhaust port for discharging processed gaseous fluid in the form of a plasma from the cavity; and plasma confinement means for causing the gaseous fluid to flow into the electro-magnetic resonator cavity through the aperture along with the electro-magnetic energy for confining and stabilizing the plasma within the electro-magnetic resonator cavity.
- Assignee:
- Research-Cottrell, Inc., Somerville, NJ (United States)
- Patent Number(s):
- US 4883570; A
- Application Number:
- PPN: US 7-60048
- OSTI ID:
- 7234365
- Resource Relation:
- Patent File Date: 8 Jun 1987
- Country of Publication:
- United States
- Language:
- English
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