Tungsten-carbon multilayers for x-ray optics prepared by ArF excimer-laser-induced chemical vapor deposition

Journal Article · Wed Aug 01 00:00:00 EDT 1990 · Journal of Applied Physics; (USA)

DOI:https://doi.org/10.1063/1.346684· OSTI ID:7075924

Mutoh, K; Yamada, Y; Iwabuchi, T; Miyata, T ^[1]

---

1. Matsushita Research Institute Tokyo, Inc., 3-10-1, Higashimita, Tama-ku, Kawasaki 214 (Japan)

The authors have studied the characteristics of tungsten (W) and carbon (C) thin films, and W/C multilayers prepared by ArF excimer-laser-induced chemical vapor deposition using tungsten hexafluoride and benzene gases. Amorphous W and C films with very smooth surfaces were obtained at substrate temperatures of 100--200 {degree}C and 100--300 {degree}C, respectively. In small-angle x-ray scattering measurements for the multilayers deposited at 200 {degree}C, a first order of multilayer reflections were clearly observed. Furthermore, Auger electron spectroscopy showed that W and C layers in the multilayers were periodically deposited.

• OSTI ID: 7075924
• Journal Information: Journal of Applied Physics; (USA), Vol. 68:3; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
CARBON
CHEMICAL VAPOR DEPOSITION
OPTICAL PROPERTIES
TUNGSTEN
AMORPHOUS STATE
AUGER ELECTRON SPECTROSCOPY
LASER RADIATION
LAYERS
SMALL ANGLE SCATTERING
THIN FILMS
X-RAY DIFFRACTION
CHEMICAL COATING
COHERENT SCATTERING
DEPOSITION
DIFFRACTION
ELECTROMAGNETIC RADIATION
ELECTRON SPECTROSCOPY
ELEMENTS
FILMS
METALS
NONMETALS
PHYSICAL PROPERTIES
RADIATIONS
SCATTERING
SPECTROSCOPY
SURFACE COATING
TRANSITION ELEMENTS
360101* - Metals & Alloys- Preparation & Fabrication