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Title: Infrared studies of the surface and gas phase reactions leading to the growth of titanium nitride thin films from tetrakis (dimethylamido) titanium and ammonia

Journal Article · · Journal of the Electrochemical Society; (United States)
DOI:https://doi.org/10.1149/1.2087327· OSTI ID:7034310
;  [1];  [2]
  1. AT and T Bell Labs., Murray Hill, NJ (United States)
  2. Illinois Univ., Urbana, IL (United States). Materials Research Lab.

In this paper, the reaction of tetrakis (dimethylamido) titanium (Ti(NME[sub 2])[sub 4]) with ammonia is studied in the gas phase and on titanium disilicide, aluminum, and copper surfaces using infrared spectroscopy. In the gas phase the main product of this reaction, dimethylamine, forms rapidly even at 300 K, and a fine yellow powder is deposited on the windows of the IR cell. Under ultrahigh vacuum conditions there is no reaction between Ti(NMe[sub 2])[sub 4] and NH[sub 3] on any of the three surfaces studied at temperatures between 300 and 650 K. Heating pure Ti(NMe[sub 2])[sub 4] to temperatures [gt] 550K in the gas phase, leads to species that contain Ti-N-C metallacycles and N=C double bonds. The thermal decomposition of Ti(NMe[sub 2])[sub 4] on both TiSi[sub 2] and Al surfaces at temperatures up to 650 K yields films that contain titanium, nitrogen, and a significant amount of carbon. No decomposition is observed on copper; instead, molecular desorption occurs below 400 K. The authors' observations are compared with the known thermal chemistry of titanium dialkylamides in solution.

DOE Contract Number:
FG02-91ER45439
OSTI ID:
7034310
Journal Information:
Journal of the Electrochemical Society; (United States), Vol. 139:12; ISSN 0013-4651
Country of Publication:
United States
Language:
English

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