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Title: Method for measuring the drift mobility in doped semiconductors

Patent ·
OSTI ID:7012006

A method for measuring the drift mobility of majority carriers in semiconductors consists of measuring the current transient in a Schottky-barrier device following the termination of a forward bias pulse. An example is given using an amorphous silicon hydrogenated material doped with 0.2% phosphorus. The method is particularly useful with material in which the dielectric relaxation time is shorter than the carrier transit time. It is particularly useful in material useful in solar cells. 10 figs.

Research Organization:
RCA Corp
DOE Contract Number:
AC03-78ET21074
Assignee:
RCA Corp., New York, NY (United States)
Patent Number(s):
US 4319187; A
Application Number:
PPN: US 6-133253
OSTI ID:
7012006
Resource Relation:
Patent File Date: 24 Mar 1980
Country of Publication:
United States
Language:
English